Method and apparatus for contact resistance measurement

Details Method and apparatus for contact resistance measurement Method and apparatus for contact resistance measurement

2006-06-13

2006-06-13

Nguyen, Vinh (Department: 2829)

Electricity: measuring and testing

Impedance, admittance or other quantities representative of...

Lumped type parameters

Reexamination Certificate

active

07061256

ABSTRACT:
A contact resistance measurement method is composed of: placing a first probe onto a first pad connected to an integrated circuit; placing a second probe onto a second pad electrically connected to the first pad; placing a third probe onto a third pad electrically connected to the first pad; measuring a first resistance between the first and second probes; measuring a second resistance between the second and third probes; measuring a third resistance between the third and first probes. A contact resistance between the first probe and the first pad is calculated from the first to third resistances.

REFERENCES:
patent: 3692987 (1972-09-01), Bos
patent: 3758745 (1973-09-01), Wilker et al.
patent: 4876515 (1989-10-01), Ball
patent: 5446395 (1995-08-01), Goto
patent: 5715147 (1998-02-01), Nagano
patent: 6674295 (2004-01-01), Kamitani
patent: 2-251162 (1990-10-01), None
patent: 8-330368 (1996-12-01), None

Affiliated with

Also associated with

Rating

Method and apparatus for contact resistance measurement does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for contact resistance measurement, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for contact resistance measurement will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3643274