Method and apparatus for compensating for process variations

Miscellaneous active electrical nonlinear devices – circuits – and – Specific identifiable device – circuit – or system – With specific source of supply or bias voltage

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

07453311

ABSTRACT:
A method and apparatus compensate for process variations in the fabrication of semiconductor devices. A semiconductor device includes a control circuit that measures a performance parameter of the device, and in response thereto selectively biases one or more well regions of the device to compensate for process variations. For some embodiments, if measurement of the performance parameter indicates that the device does not fall within a specified range of operating parameters, the control circuit biases selected well regions to sufficiently alter the operating characteristics of transistors formed therein so that the device falls within the specified range of operating parameters.

REFERENCES:
patent: 6272666 (2001-08-01), Borkar et al.
patent: 6333571 (2001-12-01), Teraoka et al.
patent: 6388483 (2002-05-01), Mizuno et al.
patent: 6753719 (2004-06-01), Bhagavatheeswaran et al.
patent: 6774705 (2004-08-01), Miyazaki et al.
patent: 6867637 (2005-03-01), Miyazaki et al.
patent: 6917237 (2005-07-01), Tschanz et al.
patent: 6943613 (2005-09-01), Miyazaki et al.
patent: 7109782 (2006-09-01), Kase
patent: 7196571 (2007-03-01), Sumita
patent: 7250807 (2007-07-01), Doyle
patent: 2006/0020838 (2006-01-01), Tschanz et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for compensating for process variations does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for compensating for process variations, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for compensating for process variations will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4027745

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.