Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – Waste gas purifier
Reexamination Certificate
2005-11-08
2005-11-08
Tran, Hien (Department: 1764)
Chemical apparatus and process disinfecting, deodorizing, preser
Chemical reactor
Waste gas purifier
C422S172000, C422S173000
Reexamination Certificate
active
06962677
ABSTRACT:
An apparatus for combustion harmfulness-elimination of PFC gas is provided, which prevents or effectively suppress the generation of byproducts and the corrosion of the inner walls of the apparatus. This apparatus comprises (a) a combustion furnace; (b) a gas introduction section formed near the combustion furnace; (c) a wet scrubber for wet-scrubbing a first gas; and (d) a connection pipe for connecting the gas introduction section to the scrubber; the connection pipe having a branch extending downward. Even if moisture is absorbed into the first gas during the wet-scrubbing process in the wet scrubber, the moisture in the first gas is automatically separated therefrom in a liquid state and flows out of the apparatus through the branch prior to reaching the gas introduction section.
REFERENCES:
patent: 5123836 (1992-06-01), Yoneda et al.
patent: 5800792 (1998-09-01), Ibaraki et al.
patent: 6482367 (2002-11-01), Imamura
patent: 62-238365 (1987-10-01), None
patent: 10-249143 (1998-09-01), None
Uehara Masayuki
Yamamiti Hiroyasu
Choate Hall & Stewart LLP
NEC LCD Technologies Ltd.
Tran Hien
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