Method and apparatus for collecting chemicals from...

Details Method and apparatus for collecting chemicals from... Method and apparatus for collecting chemicals from...

2010-02-04

2011-12-20

Kornakov, Michael (Department: 1714)

Cleaning and liquid contact with solids

Processes

Using sequentially applied treating agents

C134S033000, C134S034000, C438S014000

Reexamination Certificate

active

08080113

ABSTRACT:
An apparatus and a method are provided for accurately analyzing and evaluating a degree of contamination on a chamfered part without mixing impurities from parts other than the chamfered part into chemicals. At a position in which, on a front plane flat part of a semiconductor wafer, a boundary region bordering the chamfered part can come into contact with the chemicals, a radius direction position of the chemicals (a distance between a chemicals center and a wafer center) is determined, scanning is performed in a circumference direction, and the chemicals including impurities are collected. Then, at a position that can be brought into contact with the both chamfered part of the semiconductor wafer and the boundary region, a radius direction position of the chemicals is determined, scanning is performed in the circumference direction and the chemicals including impurities are collected. A liquid drop holder is, for instance, relatively rotated in the circumference direction from a desired start point on the circumference of the semiconductor wafer to a finish point.

REFERENCES:
patent: 2001/0039119 (2001-11-01), Kishimoto
patent: 7-159293 (1995-06-01), None
patent: 10-92889 (1998-04-01), None
patent: 11-204604 (1999-07-01), None
patent: 2000-077492 (2000-03-01), None
patent: 2002-134576 (2002-05-01), None
patent: 2002-289660 (2002-10-01), None
patent: 2005-109292 (2005-04-01), None
International Search report related to PCT/JP2005/011835.

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