Method and apparatus for coating resist and developing the coate

Details Method and apparatus for coating resist and developing the coate Method and apparatus for coating resist and developing the coate

1998-01-30

1999-10-19

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430311, 430327, 430330, G03F 900

Patent

active

059686910

ABSTRACT:
Disclosed is a resist coating-developing method, including (a) a setting step for setting a target value and an allowable range thereof, (b) a resist-coating step, (c) a pre-baking step, (d) a first cooling step, (e) a light-exposure step, (f) a line width measuring step for measuring a line width of a latent image, (g) a post-baking step, (h) a second cooling step, (i) a developing step, (j) a judging step determining whether or not the value of the line width of the latent image measured in step (f) falls within the allowable range of the target value set in step (a), (k) a calculating step determining a difference between the measured value of the latent image line width and the target value, and (l) a correcting step for correcting the process condition in at least one previous step.

REFERENCES:
patent: 5393624 (1995-02-01), Ushijima
patent: 5656182 (1997-08-01), Marchman et al.
C. J. Raymond, et al., "Scatterometry for CD measurements of etched structures", SPIE, vol. 2725, Apr. 1996, pp. 720-728.
K. P. Bishop, et al., "Grating line shape characterization using scatterometry", SPIE, vol. 1545, International Conference on the Application and Theory of Periodic Structures, Feb. 1991, pp. 64-73.
John Sturtevant, et al., Proceedings of the Spie, vol. 2196, pp. 352-359, Feb. 28, 1994, "Use Of Scatterometric Latent Image Detector in Closed Loop Feedback Control of Linewidth".
Patent Abstracts of Japan, vol. 96, No. 8, Aug. 30, 1996, JP 8-111370, Apr. 30, 1996.

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