Method and apparatus for cleaning wafers using multiple tanks

Details Method and apparatus for cleaning wafers using multiple tanks Method and apparatus for cleaning wafers using multiple tanks

1998-07-06

1999-11-23

Stinson, Frankie L.

Cleaning and liquid contact with solids

Apparatus

With plural means for supplying or applying different fluids...

1341023, 134902, 134201, 134186, 134184, 134108, B08B 302

Patent

active

059881895

ABSTRACT:
A cleaning system (1, 5) having multiple cleaning chambers (200) is provided. Each cleaning chamber (200) includes an interior region sufficient for immersing a carrier (242), which has at least one wafer disposed therein, into an ultra-clean liquid. The cleaning chamber (200) also has an inlet operably coupled to the interior region to introduce a gas into the interior region and a drain operably coupled to the interior region to remove the ultra-clean liquid from the interior region at a selected rate. A controller 14 is operably coupled to the chamber (200) for selectively controlling the selected rate. In an alternative embodiment, an installation technique (80) for the above cleaning system (1,5) is provided.

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