Method and apparatus for cleaning semiconductor devices

Details Method and apparatus for cleaning semiconductor devices Method and apparatus for cleaning semiconductor devices

1990-03-27

1992-03-31

Pal, Asok

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

134184, H01L 21463, H01L 21304

Patent

active

051004763

ABSTRACT:
An apparatus for cleaning semiconductor devices has a mixing section for mixing a chemical solution with pure water. A semiconductor substrate to be cleaned is placed on a support. An ultrasonic generator applies ultrasonic vibrations to the supplied pure water. The mixing section mixes a predetermined chemical solution with the pure water applied with the ultrasonic vibrations and supplies a desired pure water solution onto the semiconductor substrate.

REFERENCES:
patent: 4339340 (1982-07-01), Muraoka et al.
patent: 4686002 (1987-08-01), Tasset
patent: 4902350 (1990-02-01), Steck
patent: 4940494 (1990-07-01), Petit et al.
patent: 4980300 (1990-12-01), Miyashita et al.

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