Cleaning and liquid contact with solids – Processes – For metallic – siliceous – or calcareous basework – including...
Patent
1997-01-31
1999-01-12
Warden, Jill
Cleaning and liquid contact with solids
Processes
For metallic, siliceous, or calcareous basework, including...
134 6, 134 26, 134 29, 134902, 15 77, 15102, B08B 700
Patent
active
058581090
ABSTRACT:
A cleaning method and apparatus using very dilute Standard Clean 1 (SC1) for cleaning semiconductor substrates, including silicon wafers. The SC1 is delivered to the core of a brush where the solution is absorbed by the brush and then applied by the brush onto the substrate. This delivery system applies the chemical solutions uniformly to the semiconductor substrate and reduces the volumes of chemical solutions used in a scrubbing process. The process of the present invention uses SC1 to convert substrate surfaces from a hydrophobic state to a hydrophilic surface state while cleaning the wafer with the brush. A hydrophilic surface state is necessary to successfully remove surface contaminants by chemical mechanical brush cleaning.
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patent: 5581837 (1996-12-01), Uchiyama et al.
patent: 5639311 (1997-06-01), Holley et al.
Handbook of Semiconductor wafer Cleaning Technology, Noyes Pyblications, pp. 48-67 and 134-151, 1993.
Eitoku, Post-CMP Cleaning, Semicon Korea 95, pp. 29-36, Jan. 1995.
Hymes Diane J.
Krusell Wibur C.
Noorai Venus
Ravkin Mikhail
Markoff Alexander
OnTrak Systems, Inc.
Warden Jill
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