Method and apparatus for classifying a defect on a semiconductor

Details Method and apparatus for classifying a defect on a semiconductor Method and apparatus for classifying a defect on a semiconductor

1996-10-07

1999-08-24

Couso, Jose L.

Image analysis

Applications

Manufacturing or product inspection

382145, 382147, G06K 900

Patent

active

059434376

ABSTRACT:
A surface image of a semiconductor wafer having a defect is picked up as a inspection image while a surface image of a semiconductor wafer having no defect is stored in an image memory as a reference image. A density difference image between the inspection image and the reference image. By extracting the defect in wiring and non-wiring regions from the density difference image, extract images are obtained. Two luminance information for wiring and non-wiring regions are obtained from extract images. Based on the luminance information, the type of the defect is determined and a production process where the defect has occurred is detect.

REFERENCES:
patent: 5459795 (1995-10-01), Kawamura et al.
patent: 5544256 (1996-08-01), Brecher et al.

Affiliated with

Also associated with

Rating

Method and apparatus for classifying a defect on a semiconductor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for classifying a defect on a semiconductor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for classifying a defect on a semiconductor will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-474459