Coating apparatus – Gas or vapor deposition
Reexamination Certificate
2007-01-02
2007-01-02
Edwards, Laura (Department: 1734)
Coating apparatus
Gas or vapor deposition
C118S050000, C156S345290, C156S345330, C156S345340
Reexamination Certificate
active
10267208
ABSTRACT:
Disclosed relates to a method for CVD comprises steps of injecting a purge gas, which doesn't either dissolve or generate byproducts by itself, into a reaction chamber where substrates are located; and supplying a source material of vapor phase participating directly in forming a film on the substrates to an inside of the reaction chamber, thus forming a protective curtain in the inside of the reaction chamber by a mutual diffusion-suppressing action between the purge gas and source material. Besides, the invention provides an apparatus for CVD including a susceptor located in a reaction chamber producing a vacuum, on which substrates are placed and a film deposition process is made, the apparatus comprising: a reactive gas confining means, established over the susceptor, having at least a source material supply port through which a source material is supplied and a plurality of openings perforated on a surface thereof; a purge gas supply port through which a purge gas is fed into an outside of the reactive gas confining means; and an exhaust port for discharging exhaust gasses generated in the reaction chamber.
REFERENCES:
patent: 4753192 (1988-06-01), Goldsmith et al.
patent: 5273588 (1993-12-01), Foster et al.
patent: 5439524 (1995-08-01), Cain et al.
patent: 5540800 (1996-07-01), Qian
patent: 5792261 (1998-08-01), Hama et al.
patent: 5814561 (1998-09-01), Jackson
patent: 5851589 (1998-12-01), Nakayama
patent: 5953630 (1999-09-01), Maeda et al.
patent: 6033480 (2000-03-01), Chen
patent: 6096135 (2000-08-01), Guo
patent: 6097133 (2000-08-01), Shimada
patent: 6113705 (2000-09-01), Ohashi
patent: 6301434 (2001-10-01), McDiarmid
patent: 6444039 (2002-09-01), Nguyen
patent: 60-0340101 (1985-02-01), None
patent: 1-187809 (1989-07-01), None
patent: 1-286306 (1989-11-01), None
patent: 06-163439 (1994-06-01), None
patent: 09-283459 (1997-10-01), None
patent: 11-200035 (1999-07-01), None
patent: 1998-052922 (1998-09-01), None
Edwards Laura
Volpe and Koenig P.C.
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