Method and apparatus for chemical mechanical polishing

Abrading – Abrading process – Glass or stone abrading

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451 8, 451 9, 451 55, 451285, 451287, 451288, B24B 500

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active

058881204

ABSTRACT:
A method and apparatus provides a method for polishing a surface of a substrate with a polishing pad. The surface of the substrate is polished using the polishing pad. The surface of the substrate is deformed in response to changes in the polishing pad, wherein deformation of the surface of the substrate increases uniformity in polishing of the surface of the substrate.

REFERENCES:
patent: 4391511 (1983-07-01), Akiyama et al.
patent: 4506184 (1985-03-01), Siddall
patent: 4666291 (1987-05-01), Taniguchi et al.
patent: 5094536 (1992-03-01), MacDonald
patent: 5558563 (1996-09-01), Cote et al.
patent: 5567199 (1996-10-01), Huber et al.
patent: 5573877 (1996-11-01), Inoue et al.
patent: 5584746 (1996-12-01), Tanaka et al.
patent: 5607341 (1997-03-01), Leach
patent: 5624299 (1997-04-01), Shendon
patent: 5643060 (1997-07-01), Sandhu et al.

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