Coating processes – Electrical product produced
Reexamination Certificate
2006-07-21
2010-12-07
Cleveland, Michael (Department: 1712)
Coating processes
Electrical product produced
Reexamination Certificate
active
07846489
ABSTRACT:
Embodiments of the present system and method are useful for chemical deposition, particularly continuous deposition of thin films. Disclosed systems typically comprise a micromixer and a microchannel applicator. A deposition material or materials is applied to a substrate, such as an oxidized silicon substrate, a flexible substrate useful for forming flexible devices, such as flexible transistors, and combinations of different substrates. Uniform and highly oriented surface morphologies of films deposited using disclosed embodiments are clearly improved compared to films deposited by a conventional batch process. The process can be used to tailor the composition and morphology of the material deposited on a substrate. The present process can be used at low temperatures as a post-deposition, high-temperature annealing step is obviated.
REFERENCES:
patent: 5534328 (1996-07-01), Ashmead et al.
patent: 5575855 (1996-11-01), Kanai et al.
patent: 5580523 (1996-12-01), Bard
patent: 6129973 (2000-10-01), Martin et al.
patent: 6192596 (2001-02-01), Bennett et al.
patent: 6225149 (2001-05-01), Gan et al.
patent: 6537506 (2003-03-01), Schwalbe et al.
patent: 6676835 (2004-01-01), O'Connor et al.
patent: 6749814 (2004-06-01), Bergh et al.
patent: 6814859 (2004-11-01), Koehler et al.
patent: 6863867 (2005-03-01), Vanden Bussche et al.
patent: 6932951 (2005-08-01), Losey et al.
patent: 6935772 (2005-08-01), Karp et al.
patent: 6981522 (2006-01-01), O'Connor et al.
patent: 7150815 (2006-12-01), Ashmead et al.
patent: 7341917 (2008-03-01), Milliron et al.
patent: 2002/0045265 (2002-04-01), Bergh et al.
patent: 2003/0047816 (2003-03-01), Dutta
patent: 2003/0052429 (2003-03-01), Vigna et al.
patent: 2004/0256230 (2004-12-01), Yager et al.
patent: 2007/0240989 (2007-10-01), Levitan et al.
John and Andrew deMello, The Royal Society of Chemistry, 4, (2004) pp. 1N-15N.
Brent A. Ridley et al, Science, 286(1999) pp. 746-749.
Bret Ridley, PhD Thesis, MIT(1999).
Voss, C. et al., “Growth Kinetics of Thin-Film Cadmium Sulfide by Ammonia-Thiourea Based CBD,”Journal of the Electrochemical Society, 151(10), pp. C655-C660 (2004).
Hessel et al., “Micro mixers—a review on passive and active mixing principles”,Chem. Eng. Sci. 60, 2479 (2005).
Chang, Y.J. et al., “Nanocrystalline CdS MISFETs Fabricated by a Novel Continuous Flow Microreactor,”Electrochemical and Solid-State Letters, 9(5), G174-G177 (2006).
U.S. Appl. No. 10/803,502, filed Mar. 17, 2004, Paul et al.
U.S. Appl. No. 11/086,074, filed Mar. 21, 2005, Chang et al.
U.S. Appl. No. 11/086,074: Non-Final Office Action, dated Apr. 1, 2008.
U.S. Appl. No. 10/803,502: Non-Final Office Action, dated Jun. 6, 2008.
Cleveland Michael
Eslami Tabassom Tadayyon
Klarquist & Sparkman, LLP
State of Oregon acting by and though the State Board of Higher E
LandOfFree
Method and apparatus for chemical deposition does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for chemical deposition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for chemical deposition will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4195780