Method and apparatus for checking a mask pattern

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364488, 364559, 382 33, 356398, 2504911, G06F 1546

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active

052872904

ABSTRACT:
A method and an apparatus for checking a mask pattern including a plurality of mask pattern regions formed based on different design pattern rules. The method includes the steps of: defining each of the mask pattern regions as a check object region; setting a defect detection reference corresponding to a respective design pattern rule of the mask pattern regions for each of the check object regions; and detecting presence or absence of defects in the mask pattern based on the respective defect detection reference for each of the check object regions. By these steps, it is possible to realize reduction in check time of the mask pattern and improvement in throughput of the checking apparatus, without necessitating discrimination processing of pseudo defects in the mask pattern.

REFERENCES:
patent: 4559603 (1985-12-01), Yoshikawa
patent: 4600996 (1986-07-01), Kawauchi
"An Automatic Optical Printed Circuit Inspection System" by Restrick, III, SPIE vol. 116 Solid State Imaging Devices, 1977, pp. 76-81.
"An Automatic Inspection System for Printed Wiring Board Masks" by Goto et al., Pattern Recognition, vol. 12, 1980, pp. 443-455.

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