Method and apparatus for chalcogenide device formation

Details Method and apparatus for chalcogenide device formation Method and apparatus for chalcogenide device formation

2011-06-28

2011-06-28

Norton, Nadine G (Department: 1713)

Etching a substrate: processes

Gas phase etching of substrate

Reexamination Certificate

active

07967994

ABSTRACT:
Chalcogenide devices are delineated and sidewalls of the devices are sealed, in an anaerobic and/or anhydrous environment environment. Throughout the delineation and sealing steps, and any intervening steps, the sidewalls are not exposed to oxygen or water. In an illustrative embodiment, a cluster tool includes an etching tool and a sealing/deposition tool configured to etch and seal the chalcogenide devices and to maintain the devices in an anaerobic and/or anhydrous environment throughout the process.

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patent: WO2007/029938 (2007-03-01), None

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