Method and apparatus for bandwidth measurement and bandwidth...

Optics: measuring and testing – By light interference – Having partially reflecting plates in series

Reexamination Certificate

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Reexamination Certificate

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10789328

ABSTRACT:
A bandwidth meter method and apparatus for measuring the bandwidth of a spectrum of light emitted from a laser input to the bandwidth meter is disclosed, which may comprise an optical bandwidth monitor providing a first output representative of a first parameter which is indicative of the bandwidth of the light emitted from the laser and a second output representative of a second parameter which is indicative of the bandwidth of the light emitted from the laser; and, an actual bandwidth calculation apparatus utilizing the first output and the second output as part of a multivarible equation employing predetermined calibration variables specific to the optical bandwidth monitor, to calculate an actual bandwidth parameter. The apparatus and method may be implemented in a laser lithography light source and/or in an integrated circuit lithography tool.

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patent: 5970076 (1999-10-01), Hamada
patent: 6317448 (2001-11-01), Das et al.
patent: 6587214 (2003-07-01), Munks
“Contribution of polychromatic illumination to optical proximity effects in the context of Deep-UV lithography”, A. Kroyan, I. Lalovic, N. R. Farrar,Proc. 21st Annual BACUS Symposium on Photomask Technology and Management, G. T. Dao and B. J. Grenon (Eds), Monterey CA, SPIE vol. 4562, pp. 1112-1120, 2002.
“Understanding chromatic aberration impacts on lithographic imaging”, K.Lai, LLalovic, R.Fair, A.Kroyan, C. Progler, N. R. Farrar, D. Ames, K. Ahmed,J. Microlithography, Microfabrication and Microsystems, vol. 2, Issue 2, pp. 105-111, 2003.
“Modeling the effects of excimer laser bandwidth on lithographic performance” A. Kroyan, J. J. Bendik, O. Semprez, N. R. Farrar, C. G. Rowan and C. A. Mack, SPIE vol. 4000,Optical Microlithography XIII, pp. 658-664, Mar. 2000.

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