Method and apparatus for automated, in situ material...

Optics: measuring and testing – With plural diverse test or art

Reexamination Certificate

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C356S237400, C356S417000, C250S458100

Reexamination Certificate

active

07102737

ABSTRACT:
A method and apparatus for detection of a particular material, such as photo-resist material, on a sample surface are disclosed. A narrow beam of light is projected onto the sample surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a logic circuit, which determines the proper disposition of the sample. The logic circuit controls a sample-handling robotic device which sequentially transfers samples to and from a stage for testing and subsequent disposition. The method is particularly useful for detecting photo-resist material on the surface of a semiconductor wafer.

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IBM Technical Disclosure Bulletin, Mar. 1983, vol. 25, No. 10, pp. 5356-5357.
IBM Technical Disclosure Bulletin, “Monitor Wafer for Etch End Point Detection,” vol. 23, No. 8, pp. 3755-3756 (Jan. 1, 1981).

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