Method and apparatus for applying focus correction in E-beam sys

Details Method and apparatus for applying focus correction in E-beam sys Method and apparatus for applying focus correction in E-beam sys

1978-02-13

1979-01-30

Dixon, Harold A.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250396ML, A61K 2702

Patent

active

041374592

ABSTRACT:
A method and apparatus for applying focus correction to an E-beam or charged particle system to compensate for wafer warp and mask tilt. In an electron beam system including a registration system which measures the position of four registration marks with the beam and calculates the apparent magnification error of a given chip, means are also provided for using magnification and rotation error information to calculate a height error factor and to apply a compensating current to a dynamic focusing coil of the electron beam to move the effective beam focal plane to a position which matches the wafer or mask plane at each chip site.

REFERENCES:
patent: 3900736 (1975-08-01), Michail

Affiliated with

Also associated with

Rating

Method and apparatus for applying focus correction in E-beam sys does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for applying focus correction in E-beam sys, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for applying focus correction in E-beam sys will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1152161