Method and apparatus for applying flux

Metal fusion bonding – Process – With protecting of work or filler or applying flux

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118 74, 118313, 118669, 118710, 228 33, 427286, 427421, 427 96, B23K 3700

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active

056158289

ABSTRACT:
A dispensing apparatus for applying a pulsed thin stream of flux to a surface such as a printed circuit board. The stream of flux is pulsed at a high rate to apply a thin layer of flux on the surface. The dispensing head consists of multiple orifices for applying the flux to the board. The streams of flux are angularly disposed and a pan is positioned for capturing flux which passes by the board. The board is conveyed by the dispensing head. Controls are incorporated for board sensing and identification, application width selection, precise pressure control, fluid flow monitoring and system safety conditions.

REFERENCES:
patent: 4695482 (1987-09-01), Weiswurm
patent: 4697730 (1987-10-01), Spigarelli et al.
patent: 4796795 (1989-01-01), Urban
patent: 4806706 (1989-02-01), Machida et al.
patent: 4821948 (1989-04-01), Fisher et al.
patent: 4848271 (1989-07-01), Clark
patent: 4873938 (1989-10-01), Ciniglio
patent: 4898320 (1990-02-01), Dunaway et al.
patent: 4899924 (1990-02-01), Kawaguchi
patent: 4967933 (1990-11-01), Maiorca et al.
patent: 4986462 (1991-01-01), Hethcoat
patent: 5024856 (1991-06-01), Hehnerlein
patent: 5038706 (1991-08-01), Morris
patent: 5042708 (1991-08-01), Ledermann et al.
patent: 5052338 (1991-10-01), Maiorca et al.
patent: 5065692 (1991-11-01), Hollesen et al.
patent: 5065932 (1991-11-01), Hayden et al.
patent: 5074455 (1991-12-01), Peana et al.
patent: 5145531 (1992-09-01), Turner et al.
patent: 5328085 (1994-07-01), Stoops et al.
patent: 5368219 (1994-11-01), Hogan et al.

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