Method and apparatus for analyzing the state of generation of fo

Optics: measuring and testing – Inspection of flaws or impurities – Having predetermined light transmission regions

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437 8, 437939, G01N 2189, G02B 2746, G06F 1546

Patent

active

054634598

ABSTRACT:
A defect detecting apparatus including an illumination system for radiating a light of a plane wave linearly to a substrate having repetitive patterns of different pitches; a focusing optical system for focusing a light image reflected from the substrate thus illuminated by the illumination system; a spatial filter disposed intermediate the focusing optical system so as to shield a diffraction light from repetitive patterns of a small pitch on the substrate; a detector for detecting the light image formed by the focusing optical system; an erasing means for comparing and erasing signals which are generated on the basis of repetitive patterns of a large pitch and obtained through the spatial filter, out of signals detected by the detector; and a defect detecting means for detecting defects on the substrate in accordance with a signal detected by the detector, as well as a method applied to the said apparatus.

REFERENCES:
patent: 4448532 (1984-05-01), Joseph et al.
patent: 4571685 (1986-02-01), Kamoshida
patent: 5172000 (1992-12-01), Scheff et al.
patent: 5274434 (1993-12-01), Morioka et al.
patent: 5276498 (1994-01-01), Galbraith et al.

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