Method and apparatus for analyzing fabric conditions

Details Method and apparatus for analyzing fabric conditions Method and apparatus for analyzing fabric conditions

1990-12-27

1992-06-23

Boudreau, Leo H.

Image analysis

Histogram processing

For setting a threshold

382 8, 26 515, 139 1D, 356238, 356241, 364470, G06K 900

Patent

active

051250349

ABSTRACT:
A system for analyzing fabrics, knitted or woven, particularly to perform in-process analysis of stitch count or yarn count. A camera positioned over the fabric is exposed by means of a high speed strobe to form a freeze-frame image, which is digitized and stored for computer processing. An early processing step involves scanning the image along a large number of angularly displaced scanning axes, to determine the construction line of the fabric, which may be skewed relative to the imaging camera. The image is thereafter scanned along lines parallel to (and/or at right angles to) the construction line. A more precise and useful analysis is made possible by this technique. Color insensitivity is achieved without the use of expensive infra-red strobe devices, by using a common xenon strobe and a filter to exclude wave lengths below the near-infra-red range.

REFERENCES:
patent: 3517204 (1970-06-01), Mahlo et al.
patent: 4248533 (1981-02-01), Shimada
patent: 4255050 (1981-03-01), Beckstein et al.
patent: 4414476 (1983-11-01), Maddox et al.
patent: 4586372 (1986-05-01), Massen
patent: 4812140 (1989-03-01), Russell et al.
patent: 4890924 (1990-01-01), Beckstein
patent: 4953400 (1990-09-01), Bossuyt
patent: 4954962 (1990-09-01), Evans, Jr. et al.
patent: 4961149 (1990-10-01), Schneider et al.

Affiliated with

Also associated with

Rating

Method and apparatus for analyzing fabric conditions does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for analyzing fabric conditions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for analyzing fabric conditions will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-939788