Method and apparatus for analysis using X-ray spectra

Details Method and apparatus for analysis using X-ray spectra Method and apparatus for analysis using X-ray spectra

2008-10-10

2010-06-22

Kiknadze, Irakli (Department: 2882)

X-ray or gamma ray systems or devices

Specific application

Diffraction, reflection, or scattering analysis

Reexamination Certificate

active

07742565

ABSTRACT:
A method for precisely measuring and displaying the whole profile of an X-ray spectral waveform, which rises from a background level and finally returns to the background level after passing across a peak. X-rays are counted for a time interval of to at a spectral position, resulting in X-ray N counts not containing statistical fluctuations. A standard deviation Eo representing a variation accompanying the N counts is given by Sqrt(N). Where the variation is greater than a given magnitude (tolerance error Er for display) at a spectral position where the X-ray intensity is high, X-rays are counted for a time interval of tm longer than the time interval to, producing increased counts Nm.

REFERENCES:
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patent: 5912940 (1999-06-01), O'Hara
patent: 2006/0193434 (2006-08-01), Green
patent: 51-25184 (1976-03-01), None
patent: 01-312449 (1989-12-01), None
patent: 2002-181745 (2002-06-01), None

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