Method and apparatus for analysis of continuous data using...

Details Method and apparatus for analysis of continuous data using... Method and apparatus for analysis of continuous data using...

2011-03-01

2011-03-01

Bhat, Aditya (Department: 2857)

Data processing: measuring, calibrating, or testing

Measurement system in a specific environment

Quality evaluation

Reexamination Certificate

active

07899634

ABSTRACT:
A method, apparatus, and a system for generating a binary mapping of wafer regions using measured value. A first measured value relating to processing a first workpiece is acquired. A second measured value relating to a second workpiece is acquired. At least a first region common to the first and second workpieces is defined. A determination is made as to whether the results associated with the first or second measured value is above a predetermined threshold. A first binary value is assigned to the first region based upon a determination that the results associated the first or second measured value data is above the threshold.

REFERENCES:
patent: 6365425 (2002-04-01), Ikota et al.
patent: 2004/0031779 (2004-02-01), Cahill et al.

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