Method and apparatus for an improved optical window...

Details Method and apparatus for an improved optical window... Method and apparatus for an improved optical window...

2007-01-05

2010-10-12

McDonald, Rodney G (Department: 1795)

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C156S345240, C156S345250, C118S715000, C204S298320

Reexamination Certificate

active

07811428

ABSTRACT:
The present invention presents an improved optical window deposition shield for optical access to a process space in a plasma processing system through a deposition shield, wherein the design and fabrication of the optical window deposition shield advantageously provides an optically clean access to the processing plasma in the process space while sustaining substantially minimal erosion of the optical window deposition shield.

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