Method and apparatus for an improved deposition shield in a...

Coating apparatus – Gas or vapor deposition – With treating means

Reexamination Certificate

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C156S916000

Reexamination Certificate

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07137353

ABSTRACT:
The present invention presents an improved deposition shield for surrounding a process space in a plasma processing system, wherein the design and fabrication of the deposition shield advantageously provides for a clean processing plasma in the process space with substantially minimal erosion of the deposition shield.

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