Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2006-11-21
2006-11-21
Hassanzadeh, Parviz (Department: 1763)
Coating apparatus
Gas or vapor deposition
With treating means
C156S916000
Reexamination Certificate
active
07137353
ABSTRACT:
The present invention presents an improved deposition shield for surrounding a process space in a plasma processing system, wherein the design and fabrication of the deposition shield advantageously provides for a clean processing plasma in the process space with substantially minimal erosion of the deposition shield.
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Mitsuhashi Kouji
Nakayama Hiroyuki
Saigusa Hidehito
Takase Taira
Crowell Michelle
Hassanzadeh Parviz
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
Tokyo Electron Limited
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