Coating apparatus – Gas or vapor deposition
Reexamination Certificate
2007-05-07
2011-11-15
Kackar, Ram (Department: 1716)
Coating apparatus
Gas or vapor deposition
C156S345390, C204S298070
Reexamination Certificate
active
08057600
ABSTRACT:
The present invention presents an improved baffle plate for a plasma processing system, wherein the design and fabrication of the baffle plate advantageously provides for a uniform processing plasma in the process space with substantially minimal erosion of the baffle plate.
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Mitsuhashi Kouji
Nakayama Hiroyuki
Nishimoto Shinya
Chandra Satish
Kackar Ram
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
Tokyo Electron Limited
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