Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With etchant gas supply or exhaust structure located outside...
Reexamination Certificate
2007-10-16
2007-10-16
Lund, Jeffrie R (Department: 1763)
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With etchant gas supply or exhaust structure located outside...
C118S715000, C204S298070
Reexamination Certificate
active
11010373
ABSTRACT:
The present invention presents an improved baffle plate for a plasma processing system, wherein the design and fabrication of the baffle plate advantageously provides for a uniform processing plasma in the process space with substantially minimal erosion of the baffle plate.
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Mitsuhashi Kouji
Nakayama Hiroyuki
Nishimoto Shinya
Lund Jeffrie R
Tokyo Electron Limited
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