Photocopying – Projection printing and copying cameras – Step and repeat
Reexamination Certificate
2005-09-06
2005-09-06
Mathews, Alan (Department: 2851)
Photocopying
Projection printing and copying cameras
Step and repeat
C071S064120, C430S396000, C359S563000
Reexamination Certificate
active
06940583
ABSTRACT:
A method of projecting a pattern from a mask onto a substrate comprises providing an energy source, a substrate, and a mask containing a pattern of features to be projected onto the substrate, and projecting an energy beam from the energy source though the mask toward the substrate to create a projected mask pattern image. The projected mask pattern image is created by zeroth and higher orders of the energy beam. The method then includes diffracting zeroth order beams of the projected mask pattern image to an extent that prevents the zeroth order beams from reaching the substrate, while permitting higher order beams of the projected mask pattern image to reach the substrate. Preferably, the zeroth order beams of the projected mask pattern image are diffracted at an obtuse angle.
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patent: 5863712 (1999-01-01), Von Bunau et al.
“Characterization of Super-Resolution Photolithography”, H. Fukuda, R. Yamanaka, T. Terasawa, K, Hama, T. Tawa and S. Okazaki, IEEE, Apr. 1992, pp. 3.2.1-3.2.4.
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Burkhardt Martin
Butt Shahid
C. Li Todd M.
DeLio & Peterson LLC
Infineon Technologies North America Corp.
International Business Machines - Corporation
Mathews Alan
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