Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1998-07-01
2000-07-04
Berman, Jack I.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
2504923, 2504921, G21K 504
Patent
active
RE0367605
ABSTRACT:
A method and apparatus for treating material surfaces using a repetitively pulsed ion beam. In particular, a method of treating magnetic material surfaces in order to reduce surface defects, and product amorphous fine grained magnetic material with properties that can be tailored by adjusting treatment parameters of a pulsed ion beam. In addition, to a method of surface treating materials for wear and corrosion resistance using pulsed particle ion beams.
REFERENCES:
patent: 4447761 (1984-05-01), Stinnett
patent: 4587430 (1986-05-01), Adler
patent: 4733073 (1988-03-01), Becker et al.
patent: 4733091 (1988-03-01), Robinson
patent: 4764394 (1988-08-01), Conrad
Harjes et al., "Status of the Repetitive High Energy Pulsed Power Project" 8th IEEE International Pulsed Power Conference, pp. 543-548, Jun. 1991.
Stinnet et al., "Surface Treatment With Pulsed Ion Beams", Division of Plasma Physics, Seattle, WA, Nov. 1992.
Greenly et al., "Plasma-Anode Ion Diode Research at Cornell" 8th Intl. Conf. on High-Power Particle Beams, pp. 199-206, Jul. 1990.
Bloomquist Douglas D.
Buchheit Rudy
Greenly John B.
McIntyre Dale C.
Neau Eugene L.
Berman Jack I.
Sandia Corporation
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