Method and apparatus for alignment and overlay of submicron lith

Details Method and apparatus for alignment and overlay of submicron lith Method and apparatus for alignment and overlay of submicron lith

1990-07-09

1993-06-01

Nelms, David C.

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

250237G, 356401, G01B 902, G01B 1127

Patent

active

052162575

ABSTRACT:
The method of measuring the relative between submicron lithographic features on a wafer having thereon a reference characteristic associated with a reference submicron grating structure of periodicity p.sub.1 onto which there may be cast from a reticle the image of a projected submicron grating structure of different periodicity p.sub.2 comprising measuring the extent of change in a moire fringe pattern produced by the superposition of the two grating structures on the wafer.

REFERENCES:
patent: 3861798 (1975-01-01), Kobayashi et al.
patent: 3867038 (1975-02-01), Westell
patent: 4097750 (1978-06-01), Lewis et al.
patent: 4200395 (1980-04-01), Smith et al.
patent: 4371264 (1983-02-01), Lacombat et al.
patent: 4664524 (1987-05-01), Hattori et al.
M. A. van den Brink, et al., SPIE 772, Optical Microlithography VI (1987), "Performance of a wafer stepper with automatic intra-die registration correction".
D. Post, Optical Engineering, May/Jun. 1982, vol. 21, No. 3, pp. 458-467, "Developments in moire interferometry".
F. M. Gerasimov, Applied Optics, vol. 6, No. 11, Nov. 1967, pp. 1861-1865, "Use of Diffraction Gratings for Controlling a Ruling Engine".

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