Method and apparatus for aligning mask and wafer members

Details Method and apparatus for aligning mask and wafer members Method and apparatus for aligning mask and wafer members

1980-04-11

1982-04-27

Rosenberger, R. A.

Optics: measuring and testing

By alignment in lateral direction

350162ZP, 356401, G01B 1127

Patent

active

043268056

ABSTRACT:
Zone plate patterns (12,20,61,62) formed on spaced-apart mask and wafer members (10,60) are utilized for alignment purposes in the fabrication of integrated circuits. By providing off-axis illumination of the patterns, a significant mask-to-wafer alignment capability is provided in an X-ray lithographic system. This capability includes being able to correct for so-called magnification errors that arise from physical distortions in the mask and/or wafer or in other components of the system. These errors are compensated for by utilizing the zone plate patterns to form alignment marks that serve as a basis for adjusting the mask-to-wafer separation.

REFERENCES:
patent: 4037969 (1977-07-01), Feldman et al.
patent: 4127777 (1978-11-01), Binder
patent: 4153371 (1979-05-01), Koizumi et al.
patent: 4176281 (1979-11-01), Tischer et al.
patent: 4187431 (1980-02-01), Hundt

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