Method and apparatus for aligning a mask and a set of substrates

Details Method and apparatus for aligning a mask and a set of substrates Method and apparatus for aligning a mask and a set of substrates

1996-10-15

1998-08-25

Allen, Stephone B.

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

356401, G01N 2186

Patent

active

057985308

ABSTRACT:
An exposure apparatus is designed to reduce the influences of alignment errors due to dynamic fluctuations and improve the throughput while basically using an off-axis alignment scheme. A wafer stage on which a test wafer is place is step-driven in accordance with a shot arrangement in an exposure operation. Subsequently, variations in position of the wafer stage, which occur while the position of alignment marks observed by a TTR alignment system coincide with aimed positions, are stored. In an exposure operation with respect to a wafer to be exposed, the prestored variations in position of the wafer stage are reproduced when alignment of each shot area is performed in accordance with the position of each alignment mark, detected by an off-axis alignment system.

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