Method and apparatus for ALD on a rotary susceptor

Details Method and apparatus for ALD on a rotary susceptor Method and apparatus for ALD on a rotary susceptor

2005-03-22

2005-03-22

Meeks, Timothy (Department: 1762)

Coating processes

Coating by vapor, gas, or smoke

C427S255500, C427S255230, C427S569000

Reexamination Certificate

active

06869641

ABSTRACT:
A chemical vapor deposition method and apparatus is disclosed. The process is carried out in an apparatus having a number reactive zones, each surrounded by a corresponding exhaust zone, all of which are both contained within a buffer zone. Pressure relationships are controlled such that buffer gas from the buffer zone flows into the exhaust zones and reactive gas from the reactive zones flow into the exhaust zones. As a result, cross-contamination of gases between the reactive zones is avoided.

REFERENCES:
patent: 4987856 (1991-01-01), Hey et al.
patent: 5366555 (1994-11-01), Kelly
patent: 20010007244 (2001-07-01), Matsuse
patent: 20030194493 (2003-10-01), Chang et al.

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