Coating apparatus – Gas or vapor deposition
Patent
1996-05-10
1998-12-01
Bueker, Richard
Coating apparatus
Gas or vapor deposition
118715, 118730, C23C 1600
Patent
active
058432345
ABSTRACT:
A jet assembly for delivering reactant gas from a reactant gas supply to a barrel reactor reaction chamber during a chemical vapor deposition process. The jet assembly comprises a nozzle and a positioning device. The nozzle is adapted for mounting on the barrel reactor in fluid communication with the supply of reactant gas for selectively delivering a jet of reactant gas from the supply to the reaction chamber. The nozzle is pivotable relative to the barrel reactor for selectively altering the direction in which the reactant gas jet enters the reaction chamber. The positioning device is connected to the nozzle for pivoting the nozzle relative to the barrel reactor to alter the direction in which the reactant gas jet enters the reaction chamber. The positioning device is constructed to permit quantitative measurement of the position of the nozzle relative to the barrel reactor thereby permitting reproducible aiming of the nozzle for selecting the direction in which the reactant gas jet enters the reaction chamber.
REFERENCES:
patent: 4928626 (1990-05-01), Carlson et al.
AMC-7810/11 and AMC-7820/21 Cylindrical Epitaxial Reactors System Manual; Applied Materials; 1982, pp. 1-12, 1-13.
Patent Abstract of Japan, vol. 016, No. 394 (C-0976), 21 Aug. 1992, Abstract of JP 04 130085 A (Sumitomo Electric Ind Ltd) 1 May 1992.
Patent Abstract of Japan, vol. 010, No. 078 (C-335), 27 Mar. 1986, Abstract of JP 60 215594 A (Fuijitsu KK) 28 Oct. 1985.
Finn Donald
Hellwig Lance G.
Bueker Richard
MEMC Electronic Materials , Inc.
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