Method and apparatus for addressing and sustaining gas discharge

Details Method and apparatus for addressing and sustaining gas discharge Method and apparatus for addressing and sustaining gas discharge

1976-11-02

1978-07-11

Yusko, Donald J.

Communications: electrical

Digital comparator systems

315169TV, 340324M, G06F 314, H01J 1748, H05B 3700

Patent

active

041005350

ABSTRACT:
A time-voltage multiplexing system for addressing a particular cell or location on a gas discharge plasma panel in which a group of panel electrodes are charged to the cell voltage firing level but only one electrode of the group is allowed to remain charged for a time duration sufficient for selective discharging of the desired cell. A multiple secondary transformer embodiment incorporating the time-voltage multiplexing addressing system. A method and apparatus for increasing the usable range of sustaining signals for plasma panels by applying a narrow width boost pulse to the panel within a selected time immediately after the initiated sustaining discharge, including means for varying the boost pulse amplitude, width and position with respect to the sustaining discharge so that the usable sustaining signal range can be optimized for a particular plasma panel.

REFERENCES:
patent: 3811124 (1974-05-01), Kleen et al.
patent: 3906451 (1975-09-01), Strom
patent: 3908151 (1975-09-01), Schermerhorn
patent: 3919591 (1975-11-01), Criscimagna
patent: 3938107 (1976-02-01), Criscimagna
patent: 3969718 (1976-07-01), Strom
patent: 3973253 (1976-08-01), Criscimagna et al.
patent: 3976993 (1976-08-01), Hirose et al.
patent: 3979638 (1976-09-01), Ngo

Affiliated with

Also associated with

Rating

Method and apparatus for addressing and sustaining gas discharge does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for addressing and sustaining gas discharge, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for addressing and sustaining gas discharge will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-265321