Electric resistance heating devices – Heating devices – Radiant heater
Patent
1992-07-14
1994-10-25
Reynolds, Bruce A.
Electric resistance heating devices
Heating devices
Radiant heater
392416, 118724, 437247, 364557, 219497, H01L 2100
Patent
active
053596935
ABSTRACT:
A low defect rate is provided in rapid thermal processing of delicate components with reduction of defects caused by inhomogeneities of temperature during a rapid thermal processing. In a suitable system a defect-guarded RTP method is carried out in such a manner that the density of the heating energy is adjusted in consecutive intervals of time, which may be as short as desired, to such automatically controlled limiting values or to such fixed values that in the reaction chamber the difference between the primary and secondary energy densities is almost continuously held at the minimum which is achievable throughout the thermal processing whereas the ramps have predetermined slopes.
REFERENCES:
patent: 3015591 (1962-01-01), Zaratkiewicz et al.
patent: 3723053 (1973-03-01), Myers et al.
patent: 3836751 (1974-09-01), Anderson
patent: 3862397 (1975-01-01), Anderson et al.
patent: 4101759 (1978-07-01), Anthony et al.
patent: 4221956 (1980-09-01), Fielding
patent: 4356384 (1982-10-01), Gat
patent: 4432809 (1984-02-01), Chye et al.
patent: 4436985 (1984-03-01), Weber
patent: 4524264 (1985-06-01), Takeuchi
patent: 4550245 (1985-10-01), Arai et al.
patent: 4581520 (1986-04-01), Vu et al.
patent: 4640224 (1987-02-01), Bunch et al.
patent: 4678432 (1987-07-01), Teraoka
patent: 4680447 (1987-07-01), Mahawili
patent: 4698486 (1987-10-01), Sheets
patent: 4836138 (1989-06-01), Robinson et al.
patent: 4979134 (1990-12-01), Arima et al.
patent: 4982693 (1991-01-01), Ebata
patent: 5063518 (1991-11-01), Curreri et al.
patent: 5147498 (1992-09-01), Nashimoto
patent: 5151871 (1992-09-01), Matsumura et al.
Hill et al "Rapid Thermal Annealing-Theory and Practice" NATO Summer School: Reduced Thermal Processing for ULSI, Boca Raton Florida, Jun. 20 to Jul 1, 1988.
Vandenabele et al "Impact of Patterned layers on Temperature Non-Uniformity During Rapid Thermal Processing for VLSI-Applications" 1989 Spring Meeting of the Materials Research Society, Apr. 25-28, 1989.
Kakoschke "Temperature Problem with Rapid Thermal Processing for VLSI Applications", Nuclear Instruments Methods in Physics Research, B37/38(1989) pp. 753-759.
Knarr Thomas
Nenyei Zsolt
Walk Heinrich
AST elektronik GmbH
Jeffery John A.
Reynolds Bruce A.
LandOfFree
Method and apparatus for a rapid thermal processing of delicate does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for a rapid thermal processing of delicate , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for a rapid thermal processing of delicate will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-141848