Coating apparatus – Gas or vapor deposition – With treating means
Patent
1996-03-07
1997-05-20
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
With treating means
118723I, 118723IR, 118719, 118724, C23C 1600
Patent
active
056308809
ABSTRACT:
This invention utilizes a large volume plasma processor to completely ionize any feedstock material and deposit the ionized and unionized species of elements of the feedstock material on deposition stages. Apparatus is provided for generating a toroidal, high temperature, low density plasma in the large volume plasma processor. Key aspects of the method provide for (a) controlling temperature by rapid heating and (b) maintaining toroidal plasma current by rapid application of increased driving voltages. The invention provides a large surface area source of any desired elements to increase safety and thruput in microchip fabrication. Other applications include nanotechnology fabrication and improvement of surface properties of materials.
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Breneman R. Bruce
Chang Joni Y.
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