Method and a device for measuring an analog voltage in a...

Electricity: measuring and testing – Measuring – testing – or sensing electricity – per se – Balancing

Reexamination Certificate

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Details

C324S1540PB, C365S185110, C365S189090

Reexamination Certificate

active

06507183

ABSTRACT:

TECHNICAL FIELD
This invention relates to an analog voltage measuring device, particularly for use in a non-volatile memory architecture.
BACKGROUND OF THE INVENTION
Non-volatile memories, and especially flash memories, use a number of analog voltages for handling memory cell program and erase operations.
More particularly, it is known how to derive, from a reference voltage such as a bandgap voltage VBG, voltage references of elevated value to apply to the terminals of the memory cells. These elevated voltages include: a row decode reference VPCX and column decode reference VPCY for terminals of memory cells in the same row/column during a decoding step; and a program/erase voltage reference VPD for both the drain terminals of the selected cells during a writing step, and the source terminals of cells contained in a selected sector during an erasing step; a negative erase voltage reference HVNEG for the source terminals of cells contained in a decoded row during a negative gate voltage erasing step.
These elevated voltage references usually have different values according to the type of the modifying operation (program, erase, recover depleted cells) or verifying operation (program verify, erase verify, depletion verify) to be performed for the memory cells. Consequently, the operational structures which produce these voltage references need to be re-configurable, as well as stable and accurate, and able to provide reproducible outputs.
One example of a conventional operational structure adapted to generate a plurality of voltage references is shown at
1
in FIG.
1
.
The operational structure
1
includes an operational amplifier
2
having a non-inverting input terminal T
1
connected to a bandgap reference VBG, an enable input terminal T
2
receiving an enable signal ENABLE, an inverting input terminal T
3
, and a supply terminal T
4
connected to a high supply voltage reference HV.
The operational structure
1
also has an output terminal T
5
, outputting a high output voltage reference XREF. The high output voltage reference XREF is provided as a multiple of the bandgap reference VBG, through the operational amplifier
2
.
The output terminal T
5
is feedback connected to the inverting input terminal T
3
via a resistive divider
3
and a passgate feedback network
4
.
In particular, the resistive divider
3
includes first R
1
, second R
2
, third R
3
and fourth R
4
resistive elements connected together in series between the output terminal T
5
of the operational amplifier
2
and a voltage reference, specifically a ground GND.
The passgate feedback network
4
includes first PG
1
, second PG
2
and third PG
3
passgates, which are connected between the inverting input T
3
of the operational amplifier
2
and a first intermediate circuit node Y
1
formed between the first and second resistive elements R
1
and R
2
, a second intermediate circuit node Y
2
formed between the second and third resistive elements R
2
and R
3
, and a third intermediate circuit node Y
3
formed between the third and fourth resistive elements R
3
and R
4
, respectively.
The passgates PG
1
, PG
2
and PG
3
are driven by first X
1
, second X
2
and third X
3
control signals, respectively, as well as by their respective negated signals /X
1
, /X
2
and /X
3
.
To provide re-configurability for the operational structure
1
, the high output voltage reference XREF is made to vary with the values of the input voltages X
1
, X
2
and X
3
, as illustrated schematically by the plots vs. time of FIG.
2
.
In the test mode, the operational structure
1
is checked for proper operation by activating the control signals X
1
, X
2
, X
3
, the bandgap reference VBG, and the enable signal ENABLE, so that the state of the operational amplifier
2
can be reproduced at the output. After a time period which is dependent on a settling time of the output signal from the operational amplifier
1
, it thus becomes necessary to access the value of the high output voltage reference XREF to verify the state of the operational amplifier.
Additionally to producing accurate references, the operational structure
1
is expected to provide reasonable settling times of the references, in order to make the overall duration of the modify/verify operations performed for the memory cells by the structure, the shortest possible.
Briefly, in the testing or debugging mode of a storage architecture which includes an operational structure
1
for generating a plurality of voltage references, it is of vital importance to check on the accuracy of the values and the settling time of all the high voltage references involved.
Conventional storage architectures allow for three different methods of performing the last-mentioned operation: using a test pad provided on the storage architecture chip for the application of microprobes; transferring the value of the high output voltage reference XREF outside of the operational structure
1
through an external terminal or pad already provided on the chip and serving some other function, such as handling a data or address input (user mode pad), in normal operation of the chip; and providing a pad separate from the above chip pads (dummy pad or test mode-only pad) for only handling access from the outside and measuring the high output voltage reference XREF.
These prior measuring methods imply, in particular, different layouts for the chip containing the storage architecture to be measured, as illustrated schematically in
FIG. 3
by a memory chip
5
including an operational structure
1
to generate a high output voltage reference XREF on an output terminal T
5
, as previously described and shown in FIG.
1
.
The memory chip
5
includes:
a test pad
6
, which is connected directly to the output terminal T
5
and, therefore, to the high output voltage reference XREF to be measured by the first of the aforementioned measuring methods;
a pad
7
of the user mode circuitry
8
, which is already provided on the memory chip
5
and connected to the output terminal T
5
via a de-coupling block
9
driven by a signal TEST to enter the test mode; and
a dedicated pad
10
, which is added to the memory chip
5
and connected to the output terminal T
5
through another de-coupling block
11
driven by the signal TEST to enter the test mode.
In particular, the de-coupling blocks
9
and
11
include respective MOS transistors, M
1
and M
2
, having their source terminals connected to the output terminal T
5
, drain terminals connected to the pads
7
and
10
, and gate terminals driven by the signal TEST through respective logic inverters INV
1
and INV
2
.
The inverters INV
1
and INV
2
have control terminals connected to the drain terminals of the transistors M
1
and M
2
, and thence to the output terminal T
5
.
The above methods of accessing and measuring the high voltage reference XREF inside the memory architecture, and the corresponding chip layouts, are quite simple but show important limitations, as specified herein below.
In a first method, the test pad
6
of the memory chip
5
is used.
To apply this measuring method, the memory chip
5
would have to be in an open package. The method cannot be used with the memory chip
5
mounted to a board. Furthermore, since micro-probes can only be used at room temperature, any measurements which rely on a temperature analysis are ruled out.
In a second method, the test pad
7
of the user circuitry
8
of the memory chip is used.
This measuring method can be applied also to memory chips
5
placed in sealed packages. The algorithm for entering the test mode, whereby the value of the high output voltage reference XREF to be measured is transferred to the pad
7
, should not clash with the user mode circuitry
8
, and must be implemented without making access to the other test modes of the memory chip
5
too complicated.
Specifically, the pad
7
for measuring XREF cannot be one of those to be selected for accessing the test modes of the memory chip
5
. Were the pad
7
one for selection in other test modes, the associated test algorithms would h

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