Method and a device for implantation of particles into a substra

Details Method and a device for implantation of particles into a substra Method and a device for implantation of particles into a substra

1976-01-19

1977-07-12

La Roche, Eugene

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

313149, 357 91, B05C 1100

Patent

active

040356558

ABSTRACT:
Implantation of particles and especially ions is carried out by directing a particle beam onto a target and sweeping the beam in two directions at right angles. The target is subjected to a double movement of rotation about two axes which are substantially parallel to the direction of the particle beam. All the points of the target thus describe an epicycloid and are subjected to implantation by the particle beam.

REFERENCES:
patent: 3388009 (1968-06-01), King
patent: 3689766 (1972-09-01), Freeman
patent: 3778628 (1973-12-01), Robertson

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