Method and a device for epitaxial growth of objects by chemical

Coating apparatus – Gas or vapor deposition – With treating means

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118728, 118715, 117104, C23C 1600

Patent

active

060932538

ABSTRACT:
A device for epitaxial growth of objects by Chemical Vapor Deposition on a substrate comprises a susceptor adapted to receive the substrate and members for heating walls of the susceptor surrounding the substrate and thereby the substrate and a gas mixture fed to the substrate for the growth. The device comprises also members for holding the substrate in the path of the gas mixture through the susceptor at a distance from internal walls thereof.

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