Method and a device for creating a protecting atmosphere

Surgery – Means for introducing or removing material from body for... – Gas application

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

06994685

ABSTRACT:
The invention refers to a method for creating a protecting atmosphere in a volume, including the steps of: providing a device, which is arranged to permit the supply of a gas and which includes at least a supply conduit including a discharge end and a porous body provided at said discharge end, supplying said gas by means of said device through the porous body in such a way that a controlled flow of said gas is formed and providing said porous body in relation to said volume in such a way that the controlled gas flow forms a gas cushion, which substantially fills said volume, and that said gas cushion is arranged to prevent air from the environment from reaching said volume. The invention also refers to a device for creating a protecting atmosphere in a volume.

REFERENCES:
patent: 3632950 (1972-01-01), Berghof
patent: 5394643 (1995-03-01), Schmittmann
patent: 5458135 (1995-10-01), Patton et al.
patent: 5660172 (1997-08-01), Hatton
patent: 6241751 (2001-06-01), Morgan et al.
patent: 26 46 710 (1978-04-01), None
patent: 2 656 218 (1991-06-01), None
patent: WO 97/26034 (1997-07-01), None
patent: WO 99/29249 (1999-06-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and a device for creating a protecting atmosphere does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and a device for creating a protecting atmosphere, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and a device for creating a protecting atmosphere will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3635238

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.