Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product
Patent
1992-04-13
1993-10-12
Schofer, Joseph L.
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
430270, 430945, 3461351, 524310, 524312, 524315, 524317, 524318, 524385, G03C 100
Patent
active
052524400
ABSTRACT:
A methacrylic resin composition for optical discs comprising 100 parts by weight of a copolymer composed of from 95 to 99.7% by weight of methyl methacrylate (A) and from 0.3 to 5% by weight of at least one monomer (B) selected from the group consisting of methyl acrylate, ethyl acrylate and butyl acrylate, and having a heat distortion temperature of at least 95.degree. C., a melt flow rate of from 1.0 to 10.0 g/10 min and a tensile strength of at least 660 kg/cm.sup.2, and from 0.05 to 2.0 parts by weight of at least one releasing agent (C) selected from the group consisting of a fatty acid alkyl ester of the formula R.sub.1 COOR.sub.2 wherein each of R.sub.1 and R.sub.2 is an alkyl group having from 5 to 20 carbon atoms, cetanol and a stearic acid glycerol ester.
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Patent Abstracts of Japan, unexamined applications, C.field, vol. 6, No. 219, Nov.2,1982 p. 96 C. 132.
Kishimura Masaaki
Sato Fumio
Shimomura Yasunori
Mitsubishi Rayon Co. Ltd.
Mulcahy Peter D.
Schofer Joseph L.
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