Coating apparatus – Control means responsive to a randomly occurring sensed... – Responsive to condition of coating material
Patent
1977-09-28
1979-11-20
Reynolds, Wm. Carter
Coating apparatus
Control means responsive to a randomly occurring sensed...
Responsive to condition of coating material
118708, 118722, B05C 1100, C23C 1312
Patent
active
041746767
ABSTRACT:
A device for feeding materials to an evaporator of a vapor deposition apparatus comprises a balance onto which material to be evaporated is fed and an ejector associated with the balance and responsive to a predetermined weight of the substance on the balance to eject the substance from the balance through a trajectory path and into the evaporator.
REFERENCES:
patent: 2549908 (1951-04-01), Johansen
patent: 2635579 (1953-04-01), Chadsey, Jr.
patent: 3116958 (1964-01-01), Blair et al.
patent: 3446184 (1969-05-01), Johnson
patent: 4022937 (1977-05-01), Bennett et al.
Balzers Patent- und Beteiligungs Aktiengesellschaft
Reynolds Wm. Carter
LandOfFree
Metering device for a vacuum deposition apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Metering device for a vacuum deposition apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Metering device for a vacuum deposition apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-869331