Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Reexamination Certificate
2006-10-12
2011-11-15
Webb, Gregory (Department: 1761)
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
C510S176000, C134S001300
Reexamination Certificate
active
08058219
ABSTRACT:
A liquid removal composition and process for removing photoresist and/or sacrificial anti-reflective coating (SARC) material from a microelectronic device having same thereon. The liquid removal composition includes at least one organic quaternary base and at least one surface interaction enhancing additive. The composition achieves at least partial removal of photoresist and/or SARC material in the manufacture of integrated circuitry with minimal etching of metal species on the microelectronic device, such as copper and cobalt, and without damage to low-k dielectric materials employed in the microelectronic device architecture.
REFERENCES:
patent: 6551973 (2003-04-01), Moore
patent: 6599370 (2003-07-01), Skee
patent: 6752878 (2004-06-01), Montano et al.
patent: 2002/0072482 (2002-06-01), Sachdev et al.
patent: 2004/0180300 (2004-09-01), Minsek et al.
patent: 2005/0197265 (2005-09-01), Rath et al.
patent: 1128221 (2001-08-01), None
patent: 0213242 (2002-02-01), None
patent: 2004059700 (2004-07-01), None
patent: 2006074316 (2006-07-01), None
European Patent Office, Supplemental European Search Report, Dec. 5, 2008.
Baum Thomas H.
Bernhard David D.
Jiang Ping
Korzenski Michael B.
Rath Melissa K.
Advanced Technology & Materials Inc.
Fuierer Tristan A.
Moore & Van Allen PLLC
Webb Gregory
Yaghmour Rosa
LandOfFree
Metals compatible post-etch photoresist remover and/or... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Metals compatible post-etch photoresist remover and/or..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Metals compatible post-etch photoresist remover and/or... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4295680