Metalorganic chemical vapor deposition method for depositing f-s

Organic compounds -- part of the class 532-570 series – Organic compounds – Rare earth containing

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427124, 4272481, C07F 500, B05D 512, C23C 1600

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055832059

ABSTRACT:
A metalorganic chemical vapor deposition (MOCVD) method for depositing an F-series metal onto a semiconductor or other substrate or for incorporating nitrogen as a p-type dopant in Group II-VI semiconductor materials. The MOCVD method utilizes an F-series metal amide or zinc amide composition as the source compound for the F-series metal or nitrogen, respectively. Novel erbium amide and zinc amide compositions are disclosed along with methods for preparing the metal amide compositions.

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