Metallocene-produced very low density polyethylenes

Plastic article or earthenware shaping or treating: apparatus – Female mold and means to shape parison directly by internal... – Utilizing laminated parison

Reexamination Certificate

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C428S512000, C428S461000, C525S240000, C526S340100, C526S943000

Reexamination Certificate

active

06932592

ABSTRACT:
A very low density polyethylene having a density of 0.890 to 0.915 and a Dart Drop value of at least about 450 g/mil or above is disclosed. Gas phase polymerization methods are also disclosed for making very low density linear polyolefins utilizing a metallocene catalyst, and the resulting polyolefin products. In a specific embodiment, a gas phase polymerization process is disclosed relating to the formation of a linear polyethylene having a very low density, e.g., ranging from 0.890 to 0.915, but with improved toughness.

REFERENCES:
patent: 5272236 (1993-12-01), Lai et al.
patent: 5278272 (1994-01-01), Lai et al.
patent: 5976682 (1999-11-01), Eichbauer
patent: 6271323 (2001-08-01), Loveday et al.
patent: 6608149 (2003-08-01), Mawson et al.
patent: 6620757 (2003-09-01), McConville et al.
patent: RE38429 (2004-02-01), Eichbauer
patent: 2003/0213938 (2003-11-01), Farley et al.
patent: 2003/0215659 (2003-11-01), Farley et al.
patent: WO9608521 (1996-03-01), None
patent: WO9929737 (1999-06-01), None

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