Metallized polyimide film and manufacturing method therefor

Stock material or miscellaneous articles – Web or sheet containing structurally defined element or... – Including a second component containing structurally defined...

Reexamination Certificate

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C428S328000, C428S330000, C428S331000, C428S458000, C428S473500, C427S532000, C427S533000, C427S535000, C427S536000, C427S537000, C427S547000, C427S551000

Reexamination Certificate

active

11044760

ABSTRACT:
A metallized polyimide film includes: a polyimide film; an intermediate layer formed in the polyimide film, the intermediate layer extending 20 nm or less from a surface of the polyimide film, and the intermediate layer including at least one element selected from the group consisting of Mo, Cr, Ni, and Si injected into the polyimide film; and a conductive layer that is made of copper or a copper alloy formed on the intermediate layer, wherein the amount of the at least one element injected into the intermediate layer is between 0.3 and 15 mg/m2.

REFERENCES:
patent: 6767644 (2004-07-01), Aida
patent: 6812164 (2004-11-01), Yamaguchi et al.
patent: 2003-011273 (2003-01-01), None

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