Metallized film wound capacitor having minimized inductive react

Electricity: electrical systems and devices – Electrostatic capacitors – Fixed capacitor

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

29 2542, H01G 114, H01G 700

Patent

active

045478325

ABSTRACT:
A method is disclosed for making a wound capacitor having decreased inherent inductance and a high self-resonant frequency. In making this capacitor, metallized film is wound around a non-conductive polycarbonate core and a conductor is inserted through the entire length of the core. The wound metallized film is flattened and terminals are formed at opposite ends of the flattened wound capacitor. The conductor is folded over and electrically connected to one terminal and a metal contact is electrically connected to the other terminal. The electromagnetic field created around the conductor is approximately equal and in the opposite direction to the electromagnetic field created around the wound metallized film. Therefore, the inductive reactance of the conductor and the inductive reactance of the wound film are approximately equal. These reactances approximately cancel resulting in increased self-resonant frequency.

REFERENCES:
patent: 3364401 (1968-01-01), Rayburn
patent: 3513369 (1970-05-01), England et al.
patent: 4345298 (1982-08-01), Grahame
patent: 4477953 (1984-10-01), Lobo et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Metallized film wound capacitor having minimized inductive react does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Metallized film wound capacitor having minimized inductive react, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Metallized film wound capacitor having minimized inductive react will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2432057

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.