Metallization to improve electromigration resistance

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified configuration

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

257763, H01L 2348, H01L 2352

Patent

active

058281347

ABSTRACT:
A new method of metallization using a new design of metal contact shape, contact/via profile, and metal lines having considerably reduced current density and improved electromigration of metal lines is achieved. Metal contacts are formed in a rectangular shape instead of a square shape with the wider side perpendicular to the current direction. Contact openings are made having concavo-concave profiles which can provide a wider conducting cross-sectional area than can conventional openings with a vertical profile near the contact bottom. Gaps are formed within wide and high current metal lines so that current density can be effectively lowered by utilizing the whole metal line uniformly.

REFERENCES:
patent: 3648131 (1972-03-01), Stuby
patent: 4809055 (1989-02-01), Ishibashi et al.
patent: 4812419 (1989-03-01), Lee et al.
patent: 4893167 (1990-01-01), Boudou et al.
patent: 4920070 (1990-04-01), Mukai
patent: 5192988 (1993-03-01), Yoshii
patent: 5356834 (1994-10-01), Sugimoto et al.
patent: 5364817 (1994-11-01), Lur et al.
patent: 5368682 (1994-11-01), Park
patent: 5408130 (1995-04-01), Woo et al.
patent: 5608265 (1997-03-01), Kitano et al.
Silicon C4 Mask, IBM TDB vol. 40 No. 03 Mar. 1997.
New Methods for Defining Fine Lines and Small Geometry Patterns from Polymer Swelling Phenomenon, IBM TDB vol. 36 No. 06A Jun. 1993.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Metallization to improve electromigration resistance does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Metallization to improve electromigration resistance, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Metallization to improve electromigration resistance will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1615617

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.