Metallization technique for integrated circuit structures

Fishing – trapping – and vermin destroying

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148DIG20, 148DIG51, 148DIG158, 156656, 357 68, 437228, H01L 21306, B44C 122

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046960988

ABSTRACT:
The invention discloses an improved process for forming one or more metal strips on an integrated circuit structure by wet etching of a metal layer which comprises forming an intermediate layer over the integrated circuit structure; forming slots in the intermediate layer; forming a metal layer over the intermediate layer; and wet etching the metal layer sufficiently to remove all metal in the slots while retaining metal on the intermediate layer between the slots to form the desired one or more metal strips. Multiple levels of metal strips may be formed in an integrated circuit structure using the method of the invention.

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Sachdev et al., "Tungsten Interconnects in VLSI", Proceedings of the 1985 Workshop, Oct. 7-9, 1985, Albuquerque, NM, pp. 161 & 171.

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