Metallic silicide production

Details Metallic silicide production Metallic silicide production

1983-02-03

1984-08-28

Demers, Arthur P.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204192SP, 204192C, C23C 1500

Patent

active

044683081

ABSTRACT:
A metallic silicide layer is formed on a substrate by pulse heating, in an inert atmosphere, metal and silicon deposited on the substrate to a temperature and for a time sufficient to cause interdiffusion of the metal and silicon.

REFERENCES:
patent: 3661760 (1972-05-01), Borgne
patent: 3779273 (1976-09-01), Panzera
patent: 3912461 (1975-10-01), Wakefield
patent: 3927225 (1975-12-01), Cordes et al.
patent: 4123566 (1978-10-01), Chatterji
patent: 4218291 (1980-08-01), Fukuyama et al.
patent: 4234622 (1980-11-01), Dubuske et al.
patent: 4281030 (1981-07-01), Silfvast
patent: 4322453 (1982-03-01), Miller
Tsaur et al., App. Phys. Lett., 34(2), 1979.

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